Title :
Particle Elimination By Design Intervention
Author_Institution :
IBM Research Division
Keywords :
Contamination; Design engineering; Electrodes; Manufacturing processes; Nuclear and plasma sciences; Plasma materials processing; Testing;
Conference_Titel :
Semiconductor Manufacturing, 1993. International Symposium on
Conference_Location :
Austin, TX, USA
DOI :
10.1109/ISSM.1993.670312
