Title :
Process Control Systems In Sub 0.5 M Factories
Author_Institution :
Texas Instrument Incorporated
Keywords :
Chemical vapor deposition; Instruments; Monitoring; Plasma applications; Plasma chemistry; Plasma materials processing; Process control; Production facilities; Semiconductor device modeling; Silicon compounds;
Conference_Titel :
Semiconductor Manufacturing, 1993. International Symposium on
Conference_Location :
Austin, TX, USA
DOI :
10.1109/ISSM.1993.670315
