Title :
Automated Preventive Maintenance Of Plasma Etch Systems With The Secs Protocol
Author :
Byrne, P.P. ; Youlton, D.S. ; Heiman, K.R. ; Miller, A.
Author_Institution :
Brookside Software
Keywords :
Etching; Fabrication; Job shop scheduling; Plasma applications; Preventive maintenance; Production; Protocols; Semiconductor device manufacture; Software performance; System performance;
Conference_Titel :
Electronics Manufacturing Technology Symposium, 1992., Thirteenth IEEE/CHMT International
Print_ISBN :
0-7803-0755-0
DOI :
10.1109/IEMT.1992.639877