• DocumentCode
    277838
  • Title

    A comparison of internal heating and temperature distribution in IGBT and DMOS devices

  • Author

    Mawby, P ; Board, K.

  • Author_Institution
    Dept. of Elect. & Electron. Eng., Univ. Coll. of Swansea, UK
  • fYear
    1991
  • fDate
    33253
  • Firstpage
    42491
  • Lastpage
    42493
  • Abstract
    Local heating effects are simulated for both types of transistor, by solving the current continuity and Poisson equation fully in 2-Dimensions and calculating local heating from the resulting Current Density and Electric Field. The effect of Generation-Recombination heating is also included and compared with the case where this is not significant. Finally this heat-source term is used in the solution of the Heat Equation in order to find the steady state temperature distribution. It is found that strong local heating effects occur in both devices with apparent cooling occurring in some regions where recombination has been ignored, which may have a beneficial effect on the locally heated regions
  • Keywords
    carrier density; insulated gate bipolar transistors; insulated gate field effect transistors; metal-insulator-semiconductor devices; Current Density; DMOS devices; Electric Field; Generation-Recombination heating; Heat Equation; IGBT; Poisson equation; cooling; current continuity; heat-source term; internal heating; locally heated regions; temperature distribution;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Integrated Power Devices, IEE Colloquium on
  • Conference_Location
    London
  • Type

    conf

  • Filename
    180814