DocumentCode
277838
Title
A comparison of internal heating and temperature distribution in IGBT and DMOS devices
Author
Mawby, P ; Board, K.
Author_Institution
Dept. of Elect. & Electron. Eng., Univ. Coll. of Swansea, UK
fYear
1991
fDate
33253
Firstpage
42491
Lastpage
42493
Abstract
Local heating effects are simulated for both types of transistor, by solving the current continuity and Poisson equation fully in 2-Dimensions and calculating local heating from the resulting Current Density and Electric Field. The effect of Generation-Recombination heating is also included and compared with the case where this is not significant. Finally this heat-source term is used in the solution of the Heat Equation in order to find the steady state temperature distribution. It is found that strong local heating effects occur in both devices with apparent cooling occurring in some regions where recombination has been ignored, which may have a beneficial effect on the locally heated regions
Keywords
carrier density; insulated gate bipolar transistors; insulated gate field effect transistors; metal-insulator-semiconductor devices; Current Density; DMOS devices; Electric Field; Generation-Recombination heating; Heat Equation; IGBT; Poisson equation; cooling; current continuity; heat-source term; internal heating; locally heated regions; temperature distribution;
fLanguage
English
Publisher
iet
Conference_Titel
Integrated Power Devices, IEE Colloquium on
Conference_Location
London
Type
conf
Filename
180814
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