• DocumentCode
    2778641
  • Title

    Realization of InGaN solar cells on (111) silicon substrate

  • Author

    Jampana, Balakrishnam ; Xu, Tianming ; Melton, Andrew ; Jamil, Muhammad ; Opila, Robert ; Honsberg, C. ; Ferguson, Ian

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Univ. of Delaware, Newark, DE, USA
  • fYear
    2010
  • fDate
    20-25 June 2010
  • Abstract
    The III-nitride material system offers substantial potential to develop high-efficiency solar cells. Currently InGaN based solar cells have been demonstrated on sapphire substrate. This substrate expense adds up significantly to the cost of solar cells realization and further issues like sapphire substrate removal are of concern. Alternatively, InGaN epitaxial layers have been successfully grown on silicon substrate. An InGaN based quantum well solar cell structure is grown simultaneously by MOCVD on both GaN/sapphire and GaN/silicon substrates. The fabricated solar cells have comparable photo-response. The Voc of InGaN solar cell on sapphire is higher while the FF of InGaN solar cell on silicon is higher.
  • Keywords
    MOCVD; elemental semiconductors; gallium compounds; indium compounds; sapphire; semiconductor epitaxial layers; semiconductor quantum wells; silicon; solar cells; Ill-nitride material system; InGaN; MOCVD; Si; epitaxial layer; high-efficiency solar cell; quantum well solar cell structure; sapphire; silicon substrate;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE
  • Conference_Location
    Honolulu, HI
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4244-5890-5
  • Type

    conf

  • DOI
    10.1109/PVSC.2010.5616748
  • Filename
    5616748