DocumentCode :
2778641
Title :
Realization of InGaN solar cells on (111) silicon substrate
Author :
Jampana, Balakrishnam ; Xu, Tianming ; Melton, Andrew ; Jamil, Muhammad ; Opila, Robert ; Honsberg, C. ; Ferguson, Ian
Author_Institution :
Dept. of Mater. Sci. & Eng., Univ. of Delaware, Newark, DE, USA
fYear :
2010
fDate :
20-25 June 2010
Abstract :
The III-nitride material system offers substantial potential to develop high-efficiency solar cells. Currently InGaN based solar cells have been demonstrated on sapphire substrate. This substrate expense adds up significantly to the cost of solar cells realization and further issues like sapphire substrate removal are of concern. Alternatively, InGaN epitaxial layers have been successfully grown on silicon substrate. An InGaN based quantum well solar cell structure is grown simultaneously by MOCVD on both GaN/sapphire and GaN/silicon substrates. The fabricated solar cells have comparable photo-response. The Voc of InGaN solar cell on sapphire is higher while the FF of InGaN solar cell on silicon is higher.
Keywords :
MOCVD; elemental semiconductors; gallium compounds; indium compounds; sapphire; semiconductor epitaxial layers; semiconductor quantum wells; silicon; solar cells; Ill-nitride material system; InGaN; MOCVD; Si; epitaxial layer; high-efficiency solar cell; quantum well solar cell structure; sapphire; silicon substrate;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE
Conference_Location :
Honolulu, HI
ISSN :
0160-8371
Print_ISBN :
978-1-4244-5890-5
Type :
conf
DOI :
10.1109/PVSC.2010.5616748
Filename :
5616748
Link To Document :
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