Alternative approaches for low temperature front surface passivation of interdigitated back contact silicon heterojunction solar cell

In this work, we investigated two alternative approaches for the front surface passivation of interdigitated back contact silicon heterojunction (IBC-SHJ) solar cells: (1) with plasma enhanced chemical vapor deposited (PEVCD) a-Si-based stack structure consisting of a-Si:H/a-SiN_x:H/a-SiC:H, and (2) with physical vapor deposited (PVD) zinc sulfide (ZnS) film. The processing temperatures for both the approaches are under 300°C. Effective surface recombination velocities (SRV) of <; 6.2cm/s and <; 35cm/s are obtained with stack structure and ZnS respectively on n-type float zone (FZ) crystalline silicon (c-Si) wafers. The anti-reflection (AR) properties of these two passivation approaches are studied and the optimization procedure of the stack structure was discussed and shown to improve the photo-generated current. The IBC-SHJ solar cells were fabricated using both the front surface passivation approaches and a 15% cell efficiency was achieved on 150μm thick FZ c-Si wafer without surface texturing and optical optimization.