DocumentCode :
2779900
Title :
Low-voltage limitations of memory-rich nano-scale CMOS LSIs
Author :
Itoh, Kiyoo ; Horiguchi, Masashi ; Yamaoka, Masanao
Author_Institution :
Hitachi Ltd., Tokyo
fYear :
2007
fDate :
11-13 Sept. 2007
Firstpage :
68
Lastpage :
75
Abstract :
The low-voltage limitations of memory-rich nano-scale CMOS LSIs using bulk CMOS and fully-depleted (FD) SOI devices are described, focusing on CMOS inverter and flip-flop circuits such as six-transistor (6-T) cells in SRAMs and sense amplifiers in DRAMs. The limitations strongly depend on the ever-larger VT variation, especially in SRAM cells and logic gates, and are improved by using the FD-SOI as well as by using repair techniques. Consequently, two possible LSIs are predicted to coexist in the deep-sub-100-nm generation: high-VDD bulk CMOS LSIs for low-cost low-standby-current applications and low-VDD FD-SOI LSIs for low-power applications.
Keywords :
CMOS integrated circuits; CMOS memory circuits; DRAM chips; SRAM chips; large scale integration; logic gates; low-power electronics; nanoelectronics; silicon-on-insulator; CMOS inverter; DRAM; SRAM; bulk CMOS; flip-flop circuits; fully-depleted SOI devices; logic gates; low-voltage limitations; memory-rich nano-scale CMOS LSI; repair techniques; sense amplifiers; six-transistor cells; size 100 nm; CMOS logic circuits; CMOS memory circuits; CMOS technology; Flip-flops; Inverters; Laboratories; Logic devices; Nanoscale devices; Random access memory; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 2007. ESSDERC 2007. 37th European
Conference_Location :
Munich
ISSN :
1930-8876
Print_ISBN :
978-1-4244-1123-8
Electronic_ISBN :
1930-8876
Type :
conf
DOI :
10.1109/ESSDERC.2007.4430883
Filename :
4430883
Link To Document :
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