DocumentCode
2779993
Title
Ablation of pristine and radiation exposed CR-39 polymer using a 157nm laser
Author
Cockcroft, Stephanie ; Dyer, Peter E. ; Moore, Craig ; Walton, C.D. ; Zakaria, Rozalina
Author_Institution
Dept. of Phys., Univ. of Hull, Kingston upon Hull, UK
fYear
2009
fDate
14-19 June 2009
Firstpage
1
Lastpage
1
Abstract
In this paper, an investigation of the ablation of polymer CR-39 (allyl diglycol carbonate) surface using 157 nm F2 laser radiation was described, motivated by an interest in producing optical microstructures and the possibility of revealing radiation damage tracks by photoablation. The effective absorption coefficient and the etch depth-fluence were plotted. Canonical structure developed was compared to that of other UV laser-polymer ablation experiments. Results were confirmed by modelling which provides good description of the fringes and scalloping effect. Experiments using nano- and micro-particles to seed cones, and micro- whiskers to generate analogous prismatic structures on CR-39 are currently underway. CR-39 samples were also exposed to alpha particles (4.87 and 4.61 MeV) which showed no morphological evidence of radiation damage when etched using F2 laser. This is likely because the radius of damage tracks in the polymer is typically ~5 nm and hence ´un-resolvable´ at a wavelength of 157 nm. However, interesting effects have been seen in radiation-exposed samples that were chemically etched in NaOH to reveal deep tracks of a few microns diameter and then ablated at 157 nm. These include smoothing of the edges of tracks due to melt flow relaxation and, under multiple pulse exposure, a significantly increased density of conical structures, apparently seeded by the edges of tracks.
Keywords
absorption coefficients; etching; laser ablation; nanoparticles; polymer structure; whiskers (crystal); F2 laser radiation; UV laser-polymer ablation; absorption coefficient; allyl diglycol carbonate; canonical structure; edge smoothing; electron volt energy 4.61 MeV; electron volt energy 4.86 MeV; etch depth-fluence; fringes; microparticles; microwhiskers; nanoparticles; optical microstructures; photoablation; polymer CR-39; prismatic structures; pristine; radiation damage; scalloping; wavelength 157 nm; Alpha particles; Electromagnetic wave absorption; Etching; Laser ablation; Laser modes; Microstructure; Optical polymers; Optical surface waves; Surface emitting lasers; Surface morphology;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location
Munich
Print_ISBN
978-1-4244-4079-5
Electronic_ISBN
978-1-4244-4080-1
Type
conf
DOI
10.1109/CLEOE-EQEC.2009.5191776
Filename
5191776
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