DocumentCode
2780859
Title
Threshold voltage in tunnel FETs: physical definition, extraction, scaling and impact on IC design
Author
Boucart, Kathy ; Ionescu, Adrian M.
Author_Institution
Lab. of Micro & Nano-Electron. Devices, Lausanne
fYear
2007
fDate
11-13 Sept. 2007
Firstpage
299
Lastpage
302
Abstract
This work reports on the physical definition and extraction of threshold voltage in tunnel FETs based on numerical simulation data. It is shown that the tunnel FET has the outstanding property of having two threshold voltages: one in terms of gate voltage, VTG, and one in terms of drain voltage, VTD. These threshold voltages can be physically defined based on the saturation of the barrier width narrowing with respect to VG or VD. The extractions of VTG and VTD are performed based on the transconductance change method in the double gate tunnel FET with a high-k dielectric, and a systematic comparison with the constant current method is reported. The effect of gate length scaling on these threshold voltages, current, conductance characteristics, gm/ID and gm/gds of the tunnel FET is investigated for the first time.
Keywords
field effect transistors; high-k dielectric thin films; integrated circuit design; tunnel transistors; IC design; barrier width saturation; double gate tunnel FET; gate length scaling; high-k dielectric; threshold voltage extraction; transconductance change method; Data mining; Double-gate FETs; High-K gate dielectrics; Insulation; MOSFETs; P-i-n diodes; Semiconductor device modeling; Switches; Threshold voltage; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 2007. ESSDERC 2007. 37th European
Conference_Location
Munich
ISSN
1930-8876
Print_ISBN
978-1-4244-1123-8
Electronic_ISBN
1930-8876
Type
conf
DOI
10.1109/ESSDERC.2007.4430937
Filename
4430937
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