• DocumentCode
    2780859
  • Title

    Threshold voltage in tunnel FETs: physical definition, extraction, scaling and impact on IC design

  • Author

    Boucart, Kathy ; Ionescu, Adrian M.

  • Author_Institution
    Lab. of Micro & Nano-Electron. Devices, Lausanne
  • fYear
    2007
  • fDate
    11-13 Sept. 2007
  • Firstpage
    299
  • Lastpage
    302
  • Abstract
    This work reports on the physical definition and extraction of threshold voltage in tunnel FETs based on numerical simulation data. It is shown that the tunnel FET has the outstanding property of having two threshold voltages: one in terms of gate voltage, VTG, and one in terms of drain voltage, VTD. These threshold voltages can be physically defined based on the saturation of the barrier width narrowing with respect to VG or VD. The extractions of VTG and VTD are performed based on the transconductance change method in the double gate tunnel FET with a high-k dielectric, and a systematic comparison with the constant current method is reported. The effect of gate length scaling on these threshold voltages, current, conductance characteristics, gm/ID and gm/gds of the tunnel FET is investigated for the first time.
  • Keywords
    field effect transistors; high-k dielectric thin films; integrated circuit design; tunnel transistors; IC design; barrier width saturation; double gate tunnel FET; gate length scaling; high-k dielectric; threshold voltage extraction; transconductance change method; Data mining; Double-gate FETs; High-K gate dielectrics; Insulation; MOSFETs; P-i-n diodes; Semiconductor device modeling; Switches; Threshold voltage; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 2007. ESSDERC 2007. 37th European
  • Conference_Location
    Munich
  • ISSN
    1930-8876
  • Print_ISBN
    978-1-4244-1123-8
  • Electronic_ISBN
    1930-8876
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2007.4430937
  • Filename
    4430937