New capacitor parametric test methodology for process issues control

Author

Manceau, J.-P. ; Bajolet, A. ; Cremer, Sebastien ; Quoirin, M. ; Bruyere, S. ; Sylvestre, A. ; Gonon, P.

Author_Institution

STMicroelectron., Crolles

fYear

2007

fDate

11-13 Sept. 2007

Firstpage

398

Lastpage

401

Abstract

This paper describes a new measurement methodology based on LCR-meter tan(delta) measurement versus frequency. Directly integrated during parametric test, it gives information on capacitors key parameters like dielectric relaxation, potential dielectric contamination, extrinsic conduction, series resistance and process issue. The methodology is validated, thanks to the Kramers-Kronig relations, traditional I(V) measurements and series resistance model. Finally a practical example of a 3D MIM capacitor is studied.

Keywords

capacitors; dielectric relaxation; I V measurement; Kramers-Kronig relation; LCR-meter tan measurement; capacitor parametric test methodology; dielectric relaxation; extrinsic conduction; potential dielectric contamination; series resistance model; Dielectric losses; Dielectric measurements; Electrical resistance measurement; Frequency measurement; Leakage current; MIM capacitors; Pollution measurement; Process control; Radio frequency; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid State Device Research Conference, 2007. ESSDERC 2007. 37th European

Conference_Location

Munich

ISSN

1930-8876

Print_ISBN

978-1-4244-1123-8

Electronic_ISBN

1930-8876

Type

conf

DOI

10.1109/ESSDERC.2007.4430962

Filename

4430962