DocumentCode
2781296
Title
Microwave performance of vertical dual carrier field effect transistors and integrated circuits
Author
Huang, Chao ; Yang, Young Hwi ; Huang, D.H. ; Sun, Y.M. ; Lu, Qianxi
Author_Institution
China Aerosp. Corp., Beijing, China
fYear
2000
fDate
2000
Firstpage
13
Lastpage
16
Abstract
The authors discuss the device physics and microwave performance of the Vertical Dual Carrier Field Effect Transistor (VDCFET) and VDCFET ICs. The Si VDCFET and Si VDCFEIC have the advantages of very short effective channel, i.e. length less than 20 nm. The GaAs VDCFET and GaAs VDCFEIC have the further advantages of higher electron mobility. They can also be fabricated by molecular beam epitaxy or the MOCVD process. This new mode of operation opens up a new wide application field with better performance, including microwave, switching, and even System on a chip (SOC) application for sub-20 nm effective channel length. This is a low voltage family of devices. However, these can also be power devices through parallel connection in a matrix form of many cells to give currents in the range of amperes
Keywords
equivalent circuits; field effect MMIC; gallium arsenide; microwave field effect transistors; semiconductor device models; silicon; 20 nm; FET integrated circuits; GaAs; MOCVD process; Si; VDC FETs; device physics; electron mobility; field effect transistors; microwave performance; molecular beam epitaxy; parallel device connection; power devices; vertical dual carrier FETs; Charge carrier processes; FET integrated circuits; MOSFETs; Microwave FET integrated circuits; Microwave FETs; Microwave integrated circuits; Microwave transistors; Molecular beam epitaxial growth; Physics; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave and Millimeter Wave Technology, 2000, 2nd International Conference on. ICMMT 2000
Conference_Location
Beijing
Print_ISBN
0-7803-5743-4
Type
conf
DOI
10.1109/ICMMT.2000.895607
Filename
895607
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