Title :
Three-dimensional photonic crystals fabricated by double-angled plasma etching
Author :
Takahashi, Shigeki ; Nakamori, Takeshi ; Okano, Makoto ; Imada, Masahiro ; Noda, Susumu
Author_Institution :
Department of Electronic Science and Engineering, Kyoto University, A1-328, Kyotodaigaku-Katsura, Nishikyo-ku, 615-8510, Japan
Abstract :
Three-dimensional photonic crystals with a depth of two lattice constants are successfully fabricated by a two-stage angled plasma etching method. The sample showed ~90% reflectance and ~10dB attenuation around the photonic bandgap wavelength region.
Keywords :
Etching; Lattices; Optical attenuators; Optical device fabrication; Personal communication networks; Photonic crystals; Plasma applications; Reflectivity; Stacking; Stimulated emission;
Conference_Titel :
Quantum Electronics and Laser Science Conference, 2007. QELS '07
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
978-1-55752-834-6
DOI :
10.1109/QELS.2007.4431023
