DocumentCode :
2782728
Title :
Plasticity-Amplified Diffusivity: Dislocation Cores as Fast Diffusion Paths in CU Interconnects
Author :
Budiman, S. ; Hau-Riege, C.S. ; Besser, P.R. ; Marathe, A. ; Joo, Y.-C. ; Tamura, N. ; Patel, J.R. ; Nix, W.D.
Author_Institution :
Dept. of Mater. Sci. & Eng., Stanford Univ., CA
fYear :
2007
fDate :
15-19 April 2007
Firstpage :
122
Lastpage :
127
Abstract :
The mass transport of Cu during electromigration (EM) testing is typically dominated by interface diffusion. If a mechanism other than interface diffusion begins to affect the overall transport process, then the effective diffusivity, D, of the EM process would deviate from that of interface diffusion only. This would have fundamental implications. We have preliminary evidence that this might be the case, and we report its implications for EM lifetime assessment in this manuscript.
Keywords :
copper; electromigration; integrated circuit reliability; life testing; Cu; Cu interconnects; EM lifetime assessment; diffusion paths; dislocation cores; electromigration testing; interface diffusion; plasticity-amplified diffusivity; reliability assessment; transport process; Anodes; Cathodes; Conducting materials; Degradation; Electromigration; Electrons; Light sources; Materials science and technology; Plastics; Testing; Electromigration; dislocation core; plasticity; reliability assessment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability physics symposium, 2007. proceedings. 45th annual. ieee international
Conference_Location :
Phoenix, AZ
Print_ISBN :
1-4244-0919-5
Electronic_ISBN :
1-4244-0919-5
Type :
conf
DOI :
10.1109/RELPHY.2007.369880
Filename :
4227621
Link To Document :
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