• DocumentCode
    2783610
  • Title

    Understanding SRAM High-Temperature-Operating-Life NBTI: Statistics and Permanent vs Recoverable Damage

  • Author

    Haggag, A. ; Anderson, G. ; Parihar, S. ; Burnett, D. ; Abeln, G. ; Higman, J. ; Moosa, M.

  • Author_Institution
    Freescale Semicond., Inc., Austin, TX
  • fYear
    2007
  • fDate
    15-19 April 2007
  • Firstpage
    452
  • Lastpage
    456
  • Abstract
    The paper shows using deconvolution, SRAM Vmin shift statistics yield a spread that follows Poisson area scaling and a time- and voltage-dependence of t1/6 and V3, respectively. This is demonstrated to be consistent with permanent NBTI shift (Si-H bond breaking) relevant for end-of-life extrapolation. In contrast recoverable NBTI shift (hole trapping/detrapping) is shown to be only a function of stress duty and can be very small for realistic product duties.
  • Keywords
    SRAM chips; deconvolution; hole traps; stability; statistics; Poisson area scaling; SRAM; Si-H bond breaking; deconvolution; high-temperature-operating-life NBTI; hole trapping/detrapping; permanent NBTI shift; recoverable damage; statistics; time-dependence; voltage-dependence; Bonding; Deconvolution; Dielectric devices; Extrapolation; Niobium compounds; Random access memory; Statistics; Stress; Titanium compounds; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability physics symposium, 2007. proceedings. 45th annual. ieee international
  • Conference_Location
    Phoenix, AZ
  • Print_ISBN
    1-4244-0919-5
  • Electronic_ISBN
    1-4244-0919-5
  • Type

    conf

  • DOI
    10.1109/RELPHY.2007.369932
  • Filename
    4227673