DocumentCode :
2783797
Title :
Photo Misalignment Impact on the Hot Carrier Reliability of Lateral DMOS Devices
Author :
Brisbin, Douglas ; Lindorfer, Philipp ; Chaparala, Prasad
Author_Institution :
National Semicond. Corp., Santa Clara, CA
fYear :
2007
fDate :
15-19 April 2007
Firstpage :
498
Lastpage :
502
Abstract :
Power management devices often require operation in the 20 V to 30 V range. A common choice for the power MOS driver is an n-channel lateral DMOS (N-LDMOS) device. An advantage of N-LDMOS device is that it can easily be integrated within existing technologies to handle a wide range of operating voltages without significant process changes. Because of the high voltages applied to the N-LDMOS device hot carrier (HC) degradation is a real reliability concern. In high power applications N-LDMOS devices are often implemented in transistor arrays where the basic cell is a dual gate single drain device. This paper focuses on understanding unusual N-LDMOS HC results in which single gate devices had significantly better HC performance than dual gate devices.
Keywords :
MOS integrated circuits; driver circuits; hot carriers; reliability; 20 to 30 V; hot carrier reliability; lateral DMOS devices; n-channel lateral DMOS device; photo misalignment impact; power MOS driver; power management devices; Application specific integrated circuits; CMOS technology; Degradation; Displays; Driver circuits; Energy management; Hot carriers; Semiconductor device reliability; Switches; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability physics symposium, 2007. proceedings. 45th annual. ieee international
Conference_Location :
Phoenix, AZ
Print_ISBN :
1-4244-0919-5
Electronic_ISBN :
1-4244-0919-5
Type :
conf
DOI :
10.1109/RELPHY.2007.369941
Filename :
4227682
Link To Document :
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