DocumentCode :
2784154
Title :
Hetero-junction microcrystalline silicon solar cells with wide-gap p-μc-Si1−xOx:H layer
Author :
Krajangsang, Taweewat ; Kasashima, Shunsuke ; Yunaz, Ihsanul Afdi ; Miyajima, Shinsuke ; Konagai, Makoto
Author_Institution :
Dept. of Phys. Electron., Tokyo Inst. of Technol., Tokyo, Japan
fYear :
2010
fDate :
20-25 June 2010
Abstract :
Preparation of p-type hydrogenated microcrystalline silicon oxide thin films (p-μc-Si1-xOx:H) by 13.56 MHz RF-PECVD method for use as a p-layer of hetero-junction μc-Si:H solar cells is presented. We investigated effects of wide-gap p-μc-Si1-xOx:H layer on the performance of hetero-junction μc-Si:H solar cells under various light intensity. We observed that a wide-gap p-μc-Si1-xOx:H is effective to improve the open circuit voltage of the solar cells. We also confirmed that the open circuit voltage (Voc) logarithmically increased with increasing the light intensity, and the enhancement of Voc improved with increasing the band gap of p-layer. These results indicate that wide-gap p-μc-Si1-xOx:H is promising for use as window layer in hetero-junction μc-Si:H solar cells.
Keywords :
energy gap; plasma CVD; semiconductor materials; semiconductor thin films; silicon compounds; solar cells; RF-PECVD method; SiO:H; band gap; frequency 13.56 MHz; heterojunction microcrystalline silicon solar cells; light intensity; open circuit voltage; p-layer; p-type hydrogenated microcrystalline silicon oxide thin films; wide-gap layer; Energy measurement; Films; Fires; Sun;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE
Conference_Location :
Honolulu, HI
ISSN :
0160-8371
Print_ISBN :
978-1-4244-5890-5
Type :
conf
DOI :
10.1109/PVSC.2010.5617037
Filename :
5617037
Link To Document :
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