Title :
Lithography, plasmonics and sub-wavelength aperture exposure technology
Author :
Ngu, Yves ; Peckerar, Marty ; Liu, Xiaoping ; Dagenais, Mario ; Messina, Mike ; Barry, John
Author_Institution :
Department of Electrical and Computer Engineering, University of Maryland, College Park, 20742, USA
Abstract :
We report enhanced transmission of 250 nm radiation by sub-wavelength square aperture arrays on silver and demonstrate its use in optical lithography with far-reduced number of addressed pixels to produce very good edge acuity.
Keywords :
Apertures; Focusing; Image resolution; Lithography; Numerical analysis; Optical arrays; Plasmons; Resists; Silver; Transistors;
Conference_Titel :
Quantum Electronics and Laser Science Conference, 2007. QELS '07
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
978-1-55752-834-6
DOI :
10.1109/QELS.2007.4431133
