• DocumentCode
    2785531
  • Title

    Nanofabrication with Ultrasonic Nanoimprint Lithography

  • Author

    Lin, Chien-Hung ; Chen, Rongshun

  • Author_Institution
    Institute of Microelectromechanical System, National Tsing Hua University, Hsinchu, Taiwan, d929208@oz.nthu.edu.tw
  • Volume
    2
  • fYear
    2006
  • fDate
    17-20 June 2006
  • Firstpage
    603
  • Lastpage
    606
  • Abstract
    The ultrasonic nanoimprint lithography method provides high productivity, energy efficiency, and low cost. We propose a new nanoimprint lithography technique based on direct heating of the polymer resist by ultrasonic vibrations instead of using heaters in conventional nanoimprint lithography. In this paper we demonstrate that ultrasonic stack design is very important to ultrasonic nanoimprint lithography system. Since properties of ultrasonic vibrations obviously affect imprint results. If the diameter of the horn is greater than twice times of the size of the mold, the transferred patterns are completely replicated from the mold. To th best imprint results, the imprinted force, ultrasonic power, and ultrasonic time should be adjusted.
  • Keywords
    nanofabrication; nanoimprint; ultrasonic; Costs; Lithography; Microelectromechanical systems; Nanofabrication; Nanolithography; Polymer films; Resists; Resonant frequency; Substrates; Ultrasonic transducers; nanofabrication; nanoimprint; ultrasonic;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2006. IEEE-NANO 2006. Sixth IEEE Conference on
  • Print_ISBN
    1-4244-0077-5
  • Type

    conf

  • DOI
    10.1109/NANO.2006.247725
  • Filename
    1717175