DocumentCode :
2785531
Title :
Nanofabrication with Ultrasonic Nanoimprint Lithography
Author :
Lin, Chien-Hung ; Chen, Rongshun
Author_Institution :
Institute of Microelectromechanical System, National Tsing Hua University, Hsinchu, Taiwan, d929208@oz.nthu.edu.tw
Volume :
2
fYear :
2006
fDate :
17-20 June 2006
Firstpage :
603
Lastpage :
606
Abstract :
The ultrasonic nanoimprint lithography method provides high productivity, energy efficiency, and low cost. We propose a new nanoimprint lithography technique based on direct heating of the polymer resist by ultrasonic vibrations instead of using heaters in conventional nanoimprint lithography. In this paper we demonstrate that ultrasonic stack design is very important to ultrasonic nanoimprint lithography system. Since properties of ultrasonic vibrations obviously affect imprint results. If the diameter of the horn is greater than twice times of the size of the mold, the transferred patterns are completely replicated from the mold. To th best imprint results, the imprinted force, ultrasonic power, and ultrasonic time should be adjusted.
Keywords :
nanofabrication; nanoimprint; ultrasonic; Costs; Lithography; Microelectromechanical systems; Nanofabrication; Nanolithography; Polymer films; Resists; Resonant frequency; Substrates; Ultrasonic transducers; nanofabrication; nanoimprint; ultrasonic;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2006. IEEE-NANO 2006. Sixth IEEE Conference on
Print_ISBN :
1-4244-0077-5
Type :
conf
DOI :
10.1109/NANO.2006.247725
Filename :
1717175
Link To Document :
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