DocumentCode
2785531
Title
Nanofabrication with Ultrasonic Nanoimprint Lithography
Author
Lin, Chien-Hung ; Chen, Rongshun
Author_Institution
Institute of Microelectromechanical System, National Tsing Hua University, Hsinchu, Taiwan, d929208@oz.nthu.edu.tw
Volume
2
fYear
2006
fDate
17-20 June 2006
Firstpage
603
Lastpage
606
Abstract
The ultrasonic nanoimprint lithography method provides high productivity, energy efficiency, and low cost. We propose a new nanoimprint lithography technique based on direct heating of the polymer resist by ultrasonic vibrations instead of using heaters in conventional nanoimprint lithography. In this paper we demonstrate that ultrasonic stack design is very important to ultrasonic nanoimprint lithography system. Since properties of ultrasonic vibrations obviously affect imprint results. If the diameter of the horn is greater than twice times of the size of the mold, the transferred patterns are completely replicated from the mold. To th best imprint results, the imprinted force, ultrasonic power, and ultrasonic time should be adjusted.
Keywords
nanofabrication; nanoimprint; ultrasonic; Costs; Lithography; Microelectromechanical systems; Nanofabrication; Nanolithography; Polymer films; Resists; Resonant frequency; Substrates; Ultrasonic transducers; nanofabrication; nanoimprint; ultrasonic;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2006. IEEE-NANO 2006. Sixth IEEE Conference on
Print_ISBN
1-4244-0077-5
Type
conf
DOI
10.1109/NANO.2006.247725
Filename
1717175
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