Title :
Molecular lithography - A quantum optical approach
Author :
Truppe, S. ; Juffmann, T. ; Geyer, P. ; Major, A. ; Ulbricht, H. ; Arndt, M.
Author_Institution :
Fac. of Phys., Univ. of Vienna, Vienna, Austria
Abstract :
A new detection method for molecular interferometry reveals the wave particle duality of large molecules in its clearest form and enables us to impress nanolitographic structures on a silicon surface. We discuss the deposition of a quantum interference pattern composed of individual high mass molecules on a silicon substrate.
Keywords :
elemental semiconductors; light interference; nanolithography; photolithography; quantum optics; silicon; Si; detection method; molecular interferometry; molecular lithography; nanolitographic structures; quantum interference; quantum optical approach; wave particle duality; Astronomy; Lithography; Microscopy; Optical interferometry; Optical surface waves; Physics; Silicon; Surface reconstruction; Surface waves; Tunneling;
Conference_Titel :
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location :
Munich
Print_ISBN :
978-1-4244-4079-5
Electronic_ISBN :
978-1-4244-4080-1
DOI :
10.1109/CLEOE-EQEC.2009.5192061
