DocumentCode
2786156
Title
Is entanglement dispensable in quantum lithography?
Author
Angelo, Milena D. ; Scarcelli, G. ; Shih, Yanhua
Author_Institution
European Laboratory for Nonlinear Spectroscopy, Via N. Carrara 1, S.to Fiorentino (FI), Italy
fYear
2007
fDate
6-11 May 2007
Firstpage
1
Lastpage
2
Abstract
Can classical light simulate the effect of quantum lithography? The analysis of the two-photon image generated both by entangled two-photon and by chaotic radiation indicates that only entanglement can double the resolution of an image.
Keywords
Chaos; Image analysis; Interference; Lenses; Light sources; Lithography; Optical imaging; Physics; Quantum entanglement; Spatial resolution;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics and Laser Science Conference, 2007. QELS '07
Conference_Location
Baltimore, MD, USA
Print_ISBN
978-1-55752-834-6
Type
conf
DOI
10.1109/QELS.2007.4431244
Filename
4431244
Link To Document