DocumentCode
2786843
Title
CEPT-a computer aided manufacturing application for managing equipment reliability and availability and maintainability in the semiconductor industry
Author
Rampali, P. ; Ramesh, Arakere ; Shah, Nimish
Author_Institution
Intel Corp., Chandler, AZ, USA
fYear
1990
fDate
1-3 Oct 1990
Firstpage
31
Lastpage
40
Abstract
The need for a comprehensive equipment information management system is crucial for driving high equipment reliability/utilization in manufacturing. The authors describe the features of one such system developed and implemented at Intel´s factories. This equipment management system was layered on top of the preexisting shop-floor computer-aided-manufacturing (CAM) system, Workstream. Focus areas of the system are tools for managing total productive maintenance (a precursor to total quality control); statistical process control on equipment monitors; features for total paper elimination and thus reduced particle generation; predictive maintenance; and reliability and maintainability analysis modules using Weibull theory. A key by-product of this functionality introduction is a vastly improved user interface to Workstream. The authors also discuss the joint efforts by Sematech and Intel to develop an analysis system which sets the foundation for an industrywide standard for the first time. Numerous shop-floor application examples are highlighted, with the focus on methodology of end user involvement and factory implementation
Keywords
CAD/CAM; database management systems; integrated circuit manufacture; maintenance engineering; manufacturing data processing; reliability; semiconductor device manufacture; statistical process control; user interfaces; CAM system; CEPT; Intel factory; Sematech; Weibull theory; Workstream; computer aided manufacturing; equipment availability; equipment information management system; equipment maintainability; equipment reliability; factory implementation; maintainability analysis modules; predictive maintenance; semiconductor industry; shop-floor application; statistical process control; total productive maintenance; user interface; Application software; CADCAM; Computer aided manufacturing; Computer displays; Information management; Maintenance; Process control; Production facilities; Quality control; Quality management;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Manufacturing Technology Symposium, 1990 Proceedings, Competitive Manufacturing for the Next Decade. IEMT Symposium, Ninth IEEE/CHMT International
Conference_Location
Washington, DC
Type
conf
DOI
10.1109/IEMT9.1990.114976
Filename
114976
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