Title :
97% top hat efficiency, 4 J/cm2 damage threshold compression gratings
Author :
Canova, F. ; Chambaret, J.P. ; Uteza, O. ; Delaporte, P. ; Tondusson, M. ; Freysz, E. ; Parriaux, O. ; Flury, M. ; Tonchev, S. ; Lyndin, N.
Author_Institution :
Laboratoire d¿Optique Appliquée, ENSTA - Ecole Polytechnique, Chemin de la Huniÿre, F-91761 Palaiseau Cedex, France
Abstract :
High diffraction efficiency all-dielectric pulse compression grating is reported with a close to 100% flat top over more than 20 nm spectral width around 800 nm wavelength and more than 4 J/cm2 damage threshold.
Keywords :
Diffraction gratings; Hafnium oxide; Mirrors; Nonhomogeneous media; Optical diffraction; Optical films; Optical pulse compression; Optical refraction; Silicon compounds; Testing;
Conference_Titel :
Quantum Electronics and Laser Science Conference, 2007. QELS '07
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
978-1-55752-834-6
DOI :
10.1109/QELS.2007.4431349
