Title :
Principles of femtosecond pulse tailoring for advanced material processing
Author :
Wollenhaupt, M. ; Englert, L. ; Sarpe-Tudoran, C. ; Baumert, T.
Author_Institution :
Inst. fur Phys. und CINSaT, Univ. Kassel, Kassel, Germany
Abstract :
Control of ionization processes with tailored femtosecond pulses is an important prerequisite for robust control of laser processing of high band gap materials. We make use of temporally asymmetric femtosecond pulses of identical fluence and identical pulse duration in order to control photo-ionization and electron-electron impact ionization. This results in observed different thresholds for material modification in fused silica as well as in reproducible lateral structures. Our strategy opens the route to develop tailored pulse shapes for controlled nanoscale material processing of dielectrics.
Keywords :
dielectric materials; high-speed optical techniques; impact ionisation; laser materials processing; optical control; optical materials; photoionisation; photonic band gap; robust control; silicon compounds; controlled nanoscale dielectric material processing; electron-electron impact ionization; femtosecond pulse tailoring; fused silica material modification; ionization process control; laser high-band gap material processing; photo-ionization control; robust control; temporally asymmetric femtosecond pulse; Dielectric materials; Impact ionization; Materials processing; Optical control; Optical materials; Optical pulses; Photonic band gap; Process control; Robust control; Shape control;
Conference_Titel :
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location :
Munich
Print_ISBN :
978-1-4244-4079-5
Electronic_ISBN :
978-1-4244-4080-1
DOI :
10.1109/CLEOE-EQEC.2009.5192210
