DocumentCode :
2788852
Title :
High density metal cross-point laser linking
Author :
Bernstein, Joseph B. ; Gleason, Edward F. ; Wyatt, Peter W.
Author_Institution :
MIT Lincoln Lab., Lexington, MA, USA
fYear :
1992
fDate :
22-24 Jan 1992
Firstpage :
176
Lastpage :
181
Abstract :
Laser-programmed inter-level metal connections have been developed as a means of achieving high-density linking for additive redundancy in restructurable logic and in wafer scale integration. The authors report on the successful linking of 8×8 cross-points of aluminium alloy lines separated by SiNx insulation. Both processing and linking issues are addressed. The processing issues are extensions of the problems associated with any reliable two-level metal process with the added concerns of making structures for laser linking. The linking issues involve aiming a laser and forming a link with minimum peripheral damage to either the connecting metal lines or the underlying oxide and silicon
Keywords :
VLSI; aluminium alloys; laser beam applications; metallisation; redundancy; 8*8 cross-points; Al alloy; WSI; additive redundancy; connecting metal lines; cross-point laser linking; high-density linking; inter-level metal connections; linking issues; minimum peripheral damage; processing issues; restructurable logic; wafer scale integration; Aluminum alloys; Etching; Insulation; Joining processes; Laser beam cutting; Logic arrays; Metal-insulator structures; Silicon compounds; Surfaces; Wafer scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Wafer Scale Integration, 1992. Proceedings., [4th] International Conference on
Conference_Location :
San Francisco, CA
Print_ISBN :
0-8186-2482-5
Type :
conf
DOI :
10.1109/ICWSI.1992.171809
Filename :
171809
Link To Document :
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