Characterization of laser-induced air plasmas and thin films using third harmonic generation microscopy

Author

Rodríguez, Cristina ; Weber, Reed A. ; Nguyen, Duy N. ; Emmert, Luke A. ; Rudolph, Wolfgang

Author_Institution

Dept. of Phys. & Astron., Univ. of New Mexico, Albuquerque, NM, USA

fYear

2012

fDate

2-5 July 2012

Firstpage

1

Lastpage

4

Abstract

Third harmonic microscopy is applied to probe electron densities in femtosecond laser-induced air plasmas, determine nonlinear susceptibilities of thin films, and image nascent, laser incubated, and laser damaged dielectric coatings with unprecedented contrast. The relative contribution of signals from the layer of interest and its surroundings is analyzed.

Keywords

electron density; harmonic generation; high-speed optical techniques; plasma diagnostics; plasma dielectric properties; plasma light propagation; plasma nonlinear processes; femtosecond laser-induced air plasmas; image nascent dielectric coatings; laser damaged dielectric coatings; laser incubated dielectric coatings; nonlinear susceptibilities; probe electron densities; thin films; third harmonic generation microscopy; Films; Laser beams; Microscopy; Plasmas; Probes; Substrates; damage precursors; femtosecond phenomena; nonlinear microscopy; optical materials; plasma diagnostics; third harmonic;

fLanguage

English

Publisher

ieee

Conference_Titel

Transparent Optical Networks (ICTON), 2012 14th International Conference on

Conference_Location

Coventry

ISSN

2161-2056

Print_ISBN

978-1-4673-2228-7

Electronic_ISBN

2161-2056

Type

conf

DOI

10.1109/ICTON.2012.6253856

Filename

6253856