Title :
Selective micrometer hole morphology shaped by an ultrashort laser
Author :
Utéza, O. ; Sanner, N. ; Chimier, B. ; Sentis, M. ; Lassonde, P. ; Légaré, F. ; Kieffer, J.C.
Author_Institution :
Lab. LP3, Univ. de la Mediterranee, Marseille, France
Abstract :
In this paper, we show that selective crater morphology, top-hat to Gaussian-like ~ 10 mum crater, can be obtained with an ultrafast laser system without any additional spatial shaping system (as a consequence, without any supplementary cost and complexity), only by varying the applied intensity on the material. The experiments are performed in single shot regime and for two pulse durations (7 and 28 fs experiments).
Keywords :
high-speed optical techniques; laser materials processing; selective crater morphology; selective micrometer hole morphology shaping; spatial shaping system; time 28 fs; time 7 fs; ultrashort laser; Dielectric materials; Laser ablation; Laser modes; Micromachining; Morphology; Optical materials; Optical pulse shaping; Optical pulses; Plasmas; Pulsed laser deposition;
Conference_Titel :
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location :
Munich
Print_ISBN :
978-1-4244-4079-5
Electronic_ISBN :
978-1-4244-4080-1
DOI :
10.1109/CLEOE-EQEC.2009.5192283
