Title :
Practical anti-microbial surfaces on nylon and polyester by UV photochemistry
Author :
Kelley, Michael J. ; Zhu, Zhengmao
Author_Institution :
Jefferson Lab and College of William & Mary, Newport News VA, USA
Abstract :
Surface radicals generated by 193 nm (nylon) or 172 nm (PET) UV light afford strongly antimicrobial amine functionality by grafting or by transformation. They are broadly effective in the lab and significantly viable in the field.
Keywords :
Chemistry; Costs; Educational institutions; Influenza; Lead; Microwave integrated circuits; Nitrogen; Photochemistry; Polymers; Positron emission tomography;
Conference_Titel :
Quantum Electronics and Laser Science Conference, 2007. QELS '07
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
978-1-55752-834-6
DOI :
10.1109/QELS.2007.4431532
