DocumentCode
2791280
Title
An "effective" capacitance based delay metric for RC interconnect
Author
Kashyap, C.V. ; Alpert, C.J. ; Devgan, A.
Author_Institution
IBM Corp., Austin, TX, USA
fYear
2000
fDate
5-9 Nov. 2000
Firstpage
229
Lastpage
234
Abstract
Efficient, yet accurate delay estimation for RC interconnect is required for the optimization loop of timing driven physical design tools. For many applications, the Elmore delay metric has been widely used due to its efficiency and ease of use. However, it is well known that the Elmore metric can have significant error since it ignores the resistive shielding of downstream capacitance. We present a new interconnect metric called ECM that accounts for this resistive shielding by computing an effective capacitance to model the downstream capacitance. ECM can also be computed with the same complexity as the Elmore delay and does not require the computation of moment. Experiments show that ECM is significantly more accurate than Elmore delay and is competitive with other metrics that use multiple moments.
Keywords
circuit complexity; circuit layout CAD; delay estimation; Elmore delay metric; RC interconnect; capacitance based delay metric; complexity; delay estimation; downstream capacitance; optimization loop; resistive shielding; timing driven physical design tools; Capacitance; Capacitors; Delay effects; Delay estimation; Design optimization; Driver circuits; Electrochemical machining; Integrated circuit interconnections; Resistors; Upper bound;
fLanguage
English
Publisher
ieee
Conference_Titel
Computer Aided Design, 2000. ICCAD-2000. IEEE/ACM International Conference on
Conference_Location
San Jose, CA, USA
ISSN
1092-3152
Print_ISBN
0-7803-6445-7
Type
conf
DOI
10.1109/ICCAD.2000.896479
Filename
896479
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