DocumentCode :
2791280
Title :
An "effective" capacitance based delay metric for RC interconnect
Author :
Kashyap, C.V. ; Alpert, C.J. ; Devgan, A.
Author_Institution :
IBM Corp., Austin, TX, USA
fYear :
2000
fDate :
5-9 Nov. 2000
Firstpage :
229
Lastpage :
234
Abstract :
Efficient, yet accurate delay estimation for RC interconnect is required for the optimization loop of timing driven physical design tools. For many applications, the Elmore delay metric has been widely used due to its efficiency and ease of use. However, it is well known that the Elmore metric can have significant error since it ignores the resistive shielding of downstream capacitance. We present a new interconnect metric called ECM that accounts for this resistive shielding by computing an effective capacitance to model the downstream capacitance. ECM can also be computed with the same complexity as the Elmore delay and does not require the computation of moment. Experiments show that ECM is significantly more accurate than Elmore delay and is competitive with other metrics that use multiple moments.
Keywords :
circuit complexity; circuit layout CAD; delay estimation; Elmore delay metric; RC interconnect; capacitance based delay metric; complexity; delay estimation; downstream capacitance; optimization loop; resistive shielding; timing driven physical design tools; Capacitance; Capacitors; Delay effects; Delay estimation; Design optimization; Driver circuits; Electrochemical machining; Integrated circuit interconnections; Resistors; Upper bound;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Computer Aided Design, 2000. ICCAD-2000. IEEE/ACM International Conference on
Conference_Location :
San Jose, CA, USA
ISSN :
1092-3152
Print_ISBN :
0-7803-6445-7
Type :
conf
DOI :
10.1109/ICCAD.2000.896479
Filename :
896479
Link To Document :
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