• DocumentCode
    2791280
  • Title

    An "effective" capacitance based delay metric for RC interconnect

  • Author

    Kashyap, C.V. ; Alpert, C.J. ; Devgan, A.

  • Author_Institution
    IBM Corp., Austin, TX, USA
  • fYear
    2000
  • fDate
    5-9 Nov. 2000
  • Firstpage
    229
  • Lastpage
    234
  • Abstract
    Efficient, yet accurate delay estimation for RC interconnect is required for the optimization loop of timing driven physical design tools. For many applications, the Elmore delay metric has been widely used due to its efficiency and ease of use. However, it is well known that the Elmore metric can have significant error since it ignores the resistive shielding of downstream capacitance. We present a new interconnect metric called ECM that accounts for this resistive shielding by computing an effective capacitance to model the downstream capacitance. ECM can also be computed with the same complexity as the Elmore delay and does not require the computation of moment. Experiments show that ECM is significantly more accurate than Elmore delay and is competitive with other metrics that use multiple moments.
  • Keywords
    circuit complexity; circuit layout CAD; delay estimation; Elmore delay metric; RC interconnect; capacitance based delay metric; complexity; delay estimation; downstream capacitance; optimization loop; resistive shielding; timing driven physical design tools; Capacitance; Capacitors; Delay effects; Delay estimation; Design optimization; Driver circuits; Electrochemical machining; Integrated circuit interconnections; Resistors; Upper bound;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computer Aided Design, 2000. ICCAD-2000. IEEE/ACM International Conference on
  • Conference_Location
    San Jose, CA, USA
  • ISSN
    1092-3152
  • Print_ISBN
    0-7803-6445-7
  • Type

    conf

  • DOI
    10.1109/ICCAD.2000.896479
  • Filename
    896479