• DocumentCode
    2791776
  • Title

    CMOS Compatible SOI MESFETs for Extreme Environment Applications

  • Author

    Vandersand, James ; Kushner, Vadim ; Yang, Jinman ; Blalock, Benjamin ; Thornton, Trevor

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Tennessee Univ., Knoxville, TN
  • fYear
    2005
  • fDate
    5-12 March 2005
  • Firstpage
    1
  • Lastpage
    7
  • Abstract
    Silicon-on-insulator MESFETs have been manufactured using a commercial SOI CMOS process and their electrical characteristics measured from room temperature up to 200deg C. No modifications were made to the CMOS process flow. The prototype devices use a CoSi2 gate material and the gate current follows the expected Shottky diode behavior. At room temperature a 0.6 mum gate length device has a threshold voltage of -0.8 V with an off-state drain current of approximately 5 nA. The device shows an attractive family of I-V curves up to 200deg C. For higher temperatures the reverse diode current makes it hard to switch the device off. Numerical simulations of a similar device with a higher barrier height PtSi gate show reasonable behavior up to 300degC
  • Keywords
    Schottky gate field effect transistors; cobalt compounds; platinum compounds; semiconductor device manufacture; silicon-on-insulator; -0.8 V; 0.6 micron; CoSi2; PtSi; SOI CMOS process; SOI MESFET; Shottky diode behavior; barrier height; gate material; reverse diode current; switching; CMOS process; Diodes; Electric variables; Electric variables measurement; Fluid flow measurement; MESFETs; Manufacturing processes; Silicon on insulator technology; Switches; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Aerospace Conference, 2005 IEEE
  • Conference_Location
    Big Sky, MT
  • Print_ISBN
    0-7803-8870-4
  • Type

    conf

  • DOI
    10.1109/AERO.2005.1559564
  • Filename
    1559564