• DocumentCode
    2792328
  • Title

    Understanding the use of low coefficient of both hygroscopic and thermal expansion polymer matrix for the inner substrate multichip packages with multilevel interconnection

  • Author

    Tsunashima, Eiichi ; Okuno, Atsushi ; Nagai, Koichirou ; Kadowaki, Mamoru ; Akiyama, Eizo

  • Author_Institution
    Matsushita Electron. Corp., Kyoto, Japan
  • fYear
    1990
  • fDate
    1-3 Oct 1990
  • Firstpage
    223
  • Lastpage
    228
  • Abstract
    The development of a multimodule package based on an organic substrate adhering to a lead frame is described. This substrate has a small coefficient of both hygroscopic and temperature expansion, which keeps the lead-frame warping to a minimum amount. Several types of wire-bonding methods can be used. As the sealing material adhered to a metallic lead frame, this substrate has shown excellent adhesion both to a transfer-molding resin and a lead frame so that inner conductors are more stably leaded out. Without metallic lead frames and with the aid of top-hat coat resin, it has improved thermal and hygroscopic coefficients. The top-hat resin and soldering resist are also furnished by an aromatic epoxy, making reflow soldering of passive components possible after semiconductor-chip mounting
  • Keywords
    lead bonding; modules; packaging; soldering; aromatic epoxy; hygroscopic expansion; inner substrate multichip packages; lead-frame warping; multilevel interconnection; multimodule package; organic substrate; passive components; sealing material; semiconductor-chip mounting; soldering resist; thermal expansion polymer matrix; top-hat coat resin; transfer-molding resin; wire-bonding methods; Adhesives; Conducting materials; Lead; Packaging; Resins; Resists; Sealing materials; Soldering; Substrates; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Manufacturing Technology Symposium, 1990 Proceedings, Competitive Manufacturing for the Next Decade. IEMT Symposium, Ninth IEEE/CHMT International
  • Conference_Location
    Washington, DC
  • Type

    conf

  • DOI
    10.1109/IEMT9.1990.115010
  • Filename
    115010