Title :
Properties and application of the SF6/CF2CL 2 gas mixtures
Author :
Qiu, Y. ; Feng, Y.P. ; Zhang, M.C. ; Guo, W.
Author_Institution :
High Voltage Div., Xi´´an Jiaotong Univ., China
Abstract :
The Townsend first ionization and electron attachment coefficients were measured in SF6/CF2/Cl2 gas mixtures using the steady-state Townsend method, and the optimal mixing ratio was found to be around 50/50. The breakdown strength of the 50/50 gas mixture in a uniform field gap or a slightly nonuniform field gap was higher than that of SF6 gas by 5%. Carbon deposition phenomena were studied in the sparked gas mixture both by visual observation and by mass spectrometry and Auger electron spectroscopy. Experiments showed that the SF6 concentration in the 50/50 gas mixture was sufficient for carbon inhibition upon sparking. Finally, a 100 kV prototype standard capacitor filled with the 50/50 gas mixture is described. The total gas pressure is 0.4 MPa, which allows the capacitor to be used in laboratories where the lowest temperature is above -12°C
Keywords :
Auger effect; Townsend discharge; electric breakdown of gases; electron attachment; gaseous insulation; mass spectrometer applications; organic compounds; sulphur compounds; 0.4 MPa; 100 kV; Auger electron spectroscopy; SF6; Townsend first ionization; breakdown strength; carbon inhibition; difluorodichloromethane; electron attachment; gas mixtures; mass spectrometry; nonuniform field gap; optimal mixing ratio; standard capacitor; steady-state Townsend method; total gas pressure; uniform field gap; visual observation; Coaxial components; Electric breakdown; Electric fields; Ionization; Sulfur hexafluoride; Voltage;
Conference_Titel :
Properties and Applications of Dielectric Materials, 1991., Proceedings of the 3rd International Conference on
Conference_Location :
Tokyo
Print_ISBN :
0-87942-568-7
DOI :
10.1109/ICPADM.1991.172082
