• DocumentCode
    2793663
  • Title

    Studies on degradation mechanism of ZnO varistor under impulse stress by thermally stimulated current

  • Author

    Meirong, Zhang ; Fuyi, Liu ; Ziyu, Liu

  • Author_Institution
    Xi´´an Jiaotong Univ., China
  • fYear
    1991
  • fDate
    8-12 Jul 1991
  • Firstpage
    513
  • Abstract
    The degradation mechanism of a ZnO varistor under impulse current stress has been studied. It is found that the impulse degradation, like DC degradation, arises from the variation of double Schottky barriers at the grain boundary which has been investigated by thermally stimulated current (TSC). It is concluded that the differing change of Schottky barriers is due to the high concentration of carriers injected into the grain boundary layer and accumulation of trapping effects in the layer, ultimately resulting in the change of Fermi levels
  • Keywords
    Schottky effect; electron traps; grain boundaries; hole traps; semiconductor device models; semiconductor materials; varistors; zinc compounds; Fermi levels; ZnO varistor; degradation mechanism; double Schottky barriers; grain boundary layer; high injection model; impulse stress; thermally stimulated current; trapping effects; Current measurement; Schottky barriers; Temperature; Thermal degradation; Thermal stresses; Thickness measurement; Time measurement; Varistors; Voltage; Zinc oxide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Properties and Applications of Dielectric Materials, 1991., Proceedings of the 3rd International Conference on
  • Conference_Location
    Tokyo
  • Print_ISBN
    0-87942-568-7
  • Type

    conf

  • DOI
    10.1109/ICPADM.1991.172110
  • Filename
    172110