DocumentCode :
2794068
Title :
Ferroelectric Ultra High-Density Data Storage Based on Scanning Nonlinear Dielectric Microscopy
Author :
Cho, Yasuo ; Hashimoto, Sunao ; Odagawa, Nozomi ; Tanaka, Kenkou ; Hiranaga, Yoshiomi
Author_Institution :
Res. Inst. of Electr. Commun., Tohoku Univ., Sendai
fYear :
2006
fDate :
5-8 Nov. 2006
Firstpage :
34
Lastpage :
39
Abstract :
Nano-sized inverted domain dots in ferroelectric materials have potential application in ultrahigh-density rewritable data storage systems. Herein, a data storage system is presented based on scanning non-linear dielectric microscopy and a thin film of ferroelectric single-crystal lithium tantalite. Through domain engineering, we succeeded to form an smallest artificial nano-domain single dot of 5.1 nm in diameter and artificial nano-domain dot-array with a memory density of 10.1 Tbit/inch2 and a bit spacing of 8.0 nm, representing the highest memory density for rewritable data storage reported to date. Sub-nanosecond (500 psec) domain switching speed also has been achieved. Next, long term retention characteristic of data with inverted domain dots is investigated by conducting heat treatment test. Obtained life time of inverted dot with the radius of 50 nm was 16.9 years at 80degC. Finally, actual information storage with low bit error and high memory density was performed. A bit error ratio of less than 1times 10-4 was achieved at an areal density of 258 Gbit/inch2. Moreover, actual information storage is demonstrated at a density of 1 Tbit/inch2.
Keywords :
dielectric polarisation; error statistics; ferroelectric storage; ferroelectric thin films; heat treatment; lithium compounds; nanostructured materials; scanning probe microscopy; LiTaO3; actual information storage; artificial nanodomain dot-array; bit error ratio; bit spacing; conducting heat treatment test; dielectric polarization direction; ferroelectric materials; ferroelectric single-crystal lithium tantalite thin film; ferroelectric ultra high-density data storage; inverted domain dots; inverted dot life time; long term data retention characteristics; memory density; nanosized inverted domain dots; radius 50 nm; scanning nonlinear dielectric microscopy; size 5.1 nm; switching speed; temperature 80 C; ultrahigh-density rewritable data storage systems; Bit error rate; Data engineering; Data storage systems; Dielectric thin films; Ferroelectric materials; Memory; Microscopy; Polarization; Probes; Testing; ferroelectric data storage; lithium tantalate; scanning nonlinear dielectric microscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Non-Volatile Memory Technology Symposium, 2006. NVMTS 2006. 7th Annual
Conference_Location :
San Mateo, CA
Print_ISBN :
0-7803-9738-X
Type :
conf
DOI :
10.1109/NVMT.2006.378872
Filename :
4228431
Link To Document :
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