• DocumentCode
    2794068
  • Title

    Ferroelectric Ultra High-Density Data Storage Based on Scanning Nonlinear Dielectric Microscopy

  • Author

    Cho, Yasuo ; Hashimoto, Sunao ; Odagawa, Nozomi ; Tanaka, Kenkou ; Hiranaga, Yoshiomi

  • Author_Institution
    Res. Inst. of Electr. Commun., Tohoku Univ., Sendai
  • fYear
    2006
  • fDate
    5-8 Nov. 2006
  • Firstpage
    34
  • Lastpage
    39
  • Abstract
    Nano-sized inverted domain dots in ferroelectric materials have potential application in ultrahigh-density rewritable data storage systems. Herein, a data storage system is presented based on scanning non-linear dielectric microscopy and a thin film of ferroelectric single-crystal lithium tantalite. Through domain engineering, we succeeded to form an smallest artificial nano-domain single dot of 5.1 nm in diameter and artificial nano-domain dot-array with a memory density of 10.1 Tbit/inch2 and a bit spacing of 8.0 nm, representing the highest memory density for rewritable data storage reported to date. Sub-nanosecond (500 psec) domain switching speed also has been achieved. Next, long term retention characteristic of data with inverted domain dots is investigated by conducting heat treatment test. Obtained life time of inverted dot with the radius of 50 nm was 16.9 years at 80degC. Finally, actual information storage with low bit error and high memory density was performed. A bit error ratio of less than 1times 10-4 was achieved at an areal density of 258 Gbit/inch2. Moreover, actual information storage is demonstrated at a density of 1 Tbit/inch2.
  • Keywords
    dielectric polarisation; error statistics; ferroelectric storage; ferroelectric thin films; heat treatment; lithium compounds; nanostructured materials; scanning probe microscopy; LiTaO3; actual information storage; artificial nanodomain dot-array; bit error ratio; bit spacing; conducting heat treatment test; dielectric polarization direction; ferroelectric materials; ferroelectric single-crystal lithium tantalite thin film; ferroelectric ultra high-density data storage; inverted domain dots; inverted dot life time; long term data retention characteristics; memory density; nanosized inverted domain dots; radius 50 nm; scanning nonlinear dielectric microscopy; size 5.1 nm; switching speed; temperature 80 C; ultrahigh-density rewritable data storage systems; Bit error rate; Data engineering; Data storage systems; Dielectric thin films; Ferroelectric materials; Memory; Microscopy; Polarization; Probes; Testing; ferroelectric data storage; lithium tantalate; scanning nonlinear dielectric microscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Non-Volatile Memory Technology Symposium, 2006. NVMTS 2006. 7th Annual
  • Conference_Location
    San Mateo, CA
  • Print_ISBN
    0-7803-9738-X
  • Type

    conf

  • DOI
    10.1109/NVMT.2006.378872
  • Filename
    4228431