• DocumentCode
    2794510
  • Title

    Mechanism for the initial current gain increase in carbon-doped heterostructure bipolar transistors

  • Author

    Chi, J.Y. ; Lu, K.

  • Author_Institution
    MA-COM Corp. R&D Center, Lowell, MA, UASA
  • fYear
    1997
  • fDate
    35715
  • Firstpage
    8
  • Lastpage
    12
  • Abstract
    This talk reports a new finding that after the initial rise, the current gain of carbon-doped AlGaAs/GaAs HBTs can be re-initiated by a 200-300°C annealing under no bias. The re-initiating is nondestructive and reproducible, therefore permitting unambiguous study of the phenomenon. A simple physical model was described to explains all the experimental results obtained on the re-initiation phenomenon
  • Keywords
    III-V semiconductors; aluminium compounds; annealing; carbon; gallium arsenide; heterojunction bipolar transistors; 200 to 300 C; AlGaAs-GaAs:C; AlGaAs/GaAs HBT; annealing; carbon-doped heterostructure bipolar transistor; current gain; re-initiation; Annealing; Bipolar transistors; Doping; Electrons; Gallium arsenide; Hydrogen; MOCVD; Packaging; Protons; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    GaAs Reliability Workshop, 1997., Proceedings
  • Conference_Location
    Anaheim, CA
  • Print_ISBN
    0-7908-0064-0
  • Type

    conf

  • DOI
    10.1109/GAASRW.1997.657046
  • Filename
    657046