• DocumentCode
    2795580
  • Title

    Filling of slot waveguides with Atomic Layer Deposition

  • Author

    Alasaarela, T. ; Säynätjoki, A. ; Stenberg, P. ; Kuittinen, M. ; Honkanen, S.

  • Author_Institution
    Micro & Nanosci. Lab., Helsinki Univ. of Technol., Espoo, Finland
  • fYear
    2009
  • fDate
    14-19 June 2009
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Slot waveguides are promising new nanostructures for confining light in low-index materials. Atomic layer deposition (ALD) could be a very suitable method to fill vertical slot waveguides with inorganic materials. Intel has the ALD technology already in production in its new high-k silicon technology, so it would be a natural choice for enabling the integration of photonic components on the same chips.
  • Keywords
    atomic layer deposition; integrated optics; nanophotonics; nanostructured materials; optical waveguides; atomic layer deposition; inorganic materials; light confinement; low-index materials; nanostructure material; photonic component integration; slot waveguides; Atomic layer deposition; Filling; High K dielectric materials; High-K gate dielectrics; Inorganic materials; Nanostructured materials; Nanostructures; Photonics; Production; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
  • Conference_Location
    Munich
  • Print_ISBN
    978-1-4244-4079-5
  • Electronic_ISBN
    978-1-4244-4080-1
  • Type

    conf

  • DOI
    10.1109/CLEOE-EQEC.2009.5192589
  • Filename
    5192589
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2795580