Title :
Filling of slot waveguides with Atomic Layer Deposition
Author :
Alasaarela, T. ; Säynätjoki, A. ; Stenberg, P. ; Kuittinen, M. ; Honkanen, S.
Author_Institution :
Micro & Nanosci. Lab., Helsinki Univ. of Technol., Espoo, Finland
Abstract :
Slot waveguides are promising new nanostructures for confining light in low-index materials. Atomic layer deposition (ALD) could be a very suitable method to fill vertical slot waveguides with inorganic materials. Intel has the ALD technology already in production in its new high-k silicon technology, so it would be a natural choice for enabling the integration of photonic components on the same chips.
Keywords :
atomic layer deposition; integrated optics; nanophotonics; nanostructured materials; optical waveguides; atomic layer deposition; inorganic materials; light confinement; low-index materials; nanostructure material; photonic component integration; slot waveguides; Atomic layer deposition; Filling; High K dielectric materials; High-K gate dielectrics; Inorganic materials; Nanostructured materials; Nanostructures; Photonics; Production; Silicon;
Conference_Titel :
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location :
Munich
Print_ISBN :
978-1-4244-4079-5
Electronic_ISBN :
978-1-4244-4080-1
DOI :
10.1109/CLEOE-EQEC.2009.5192589
