High aspect ratio nano-scale CFX structures fabricated by deep-rie

High aspect ratio (>500) nano-scale CF_x (fluorocarbon) "tube" and "test-tube" arrays were realized using Deep Reactive Ion Etching (RIE). Sidewall CF_x nano structures of 200 nm in thickness formed during Deep RIE passivation process were used for the purpose. The film thickness of CF_x was controlled from 200 nm to 500 nm, and the height more than 100 mum was available. As a result, the aspect ratio is larger than 500. This fluorocarbon tube and test-tube array are useful tools for chemical and biological applications.