Hydrophobic ZnO used in EWOD technology and SAW devices for better bio-fluid slip AT microchannel walls controlled by DC pulses

Author

Sirbu, Lilian ; Ghimpu, Lidia ; Muller, Rudolf ; Voda, I. ; Tiginyanu, Ion ; Ursaki, Veaceslav ; Dascalu, T.

Author_Institution

D. Ghitu Inst. of Electron. Eng. & Nanotechnol., Chisinau, Moldova

Volume

1

fYear

2012

fDate

15-17 Oct. 2012

Firstpage

231

Lastpage

234

Abstract

In this paper, we will review the electrowetting on dielectric (EWOD) principles applied to microfluidic devices. We replaced the usually used teflon surface by ZnO transparent film in order to obtain a device with an optical weak absorption in the diapason ranged from VIS to far-MIR and THz waves. We studied the piezoelectric characteristics of ZnO films obtained by RF magnetron sputtering in Ar+O₂ plasma. ZnO films have been grown on SiO₂/Si(100) substrate using a zinc oxide target. The morphological characteristics of the films were investigated by atomic force microscopy (AFM). We present the THz spectra from ZnO films.

Keywords

hydrophobicity; microfluidics; surface acoustic wave devices; wetting; zinc compounds; AFM; DC pulses; EWOD technology; RF magnetron sputtering; SAW devices; THz spectra; ZnO; ZnO transparent film; atomic force microscopy; biofluid slip AT microchannel walls; electrowetting on dielectric principles; hydrophobic ZnO; microfluidic devices; optical weak absorption; zinc oxide; Dielectrics; Films; Liquids; Metamaterials; Microchannel; Surface acoustic waves; Zinc oxide; EWOD; Electrowetting; Microdroplet; SAW; THz-TDS; ZnO;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference (CAS), 2012 International

Conference_Location

Sinaia

ISSN

1545-857X

Print_ISBN

978-1-4673-0737-6

Type

conf

DOI

10.1109/SMICND.2012.6400645

Filename

6400645