DocumentCode :
2798674
Title :
Degradation of InGaAs-InP heterojunction bipolar transistors under high energy electron irradiation
Author :
Bandyopadhyay, A. ; Subramanian, S. ; Chandrasekhar, S. ; Goodnick, S.M.
Author_Institution :
Dept. of Electr. & Comput. Eng., Oregon State Univ., Corvallis, OR, USA
fYear :
1998
fDate :
March 31 1998-April 2 1998
Firstpage :
98
Lastpage :
102
Abstract :
The DC characteristics of InGaAs-InP single heterojunction bipolar transistors (SHBTs) were studied for the first time under high energy (/spl sim/1 MeV) electron radiation with a cumulative dose up to 5.4/spl times/10/sup 15/ electrons/cm/sup 2/. The following degradation effects were observed for electron doses greater than 10/sup 15//cm/sup 2/: (1) decrease in collector current, (2) decrease in current gain by up to 50%, and (3) an increase in collector saturation voltage by 0.2-0.8 V depending on base current. The increase in collector saturation voltage is attributed to an increase in emitter contact resistance after irradiation. The degradation of collector current and current gain are thought to be due to increased recombination caused by radiation-induced defects in the base-emitter junction.
Keywords :
III-V semiconductors; contact resistance; electron beam effects; electron-hole recombination; gallium arsenide; heterojunction bipolar transistors; indium compounds; semiconductor device reliability; semiconductor device testing; 0.2 to 0.8 V; 1 MeV; DC characteristics; InGaAs-InP; InGaAs-InP HBT degradation; InGaAs-InP heterojunction bipolar transistors; InGaAs-InP single heterojunction bipolar transistors; base current; base-emitter junction defects; collector current; collector saturation voltage; current gain; electron degradation effects; electron dose; electron radiation cumulative dose; emitter contact resistance; high energy electron irradiation; radiation-induced defects; recombination; Degradation; Electrons; Heterojunction bipolar transistors; Indium gallium arsenide; Indium phosphide; Laboratories; Neutrons; Radiative recombination; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium Proceedings, 1998. 36th Annual. 1998 IEEE International
Conference_Location :
Reno, NV, USA
Print_ISBN :
0-7803-4400-6
Type :
conf
DOI :
10.1109/RELPHY.1998.670453
Filename :
670453
Link To Document :
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