Title :
How to improve the silicon nanocrystal memory cell performances for low power applications
Author :
Della Marca, V. ; Amouroux, J. ; Molas, G. ; Postel-Pellerin, J. ; Lalande, F. ; Boivin, P. ; Jalaguier, E. ; De Salvo, B. ; Ogier, J.
Author_Institution :
STMicroelectron., Rousset, France
Abstract :
In this paper we propose to optimize the 1T silicon nanocrystal (Si-nc) memory cell in order to reduce the energy consumption for low power applications. Optimized Channel Hot Electron Injection (a 4.5V programming window is reached consuming 1nJ) and Fowler-Nordheim programming are analyzed and compared. The tunnel oxide thickness, Si-ncs area coverage and SiN silicon nanocrystals capping layer are adjusted to optimize the data retention and endurance criteria. We present for the first time the endurance characteristics of a Si-nc cell up to 106 cycles with a final programming window of 4V.
Keywords :
elemental semiconductors; energy consumption; flash memories; hot carriers; low-power electronics; nanostructured materials; silicon; tunnelling; 1T silicon nanocrystal memory cell performance; Fowler-Nordheim programming; Si; data retention; endurance criteria; energy consumption; flash memory; low power application; nanocrystals capping layer; optimized channel hot electron injection; programming window; tunnel oxide thickness; voltage 4.5 V; Computer architecture; Microprocessors; Nanocrystals; Nonvolatile memory; Programming; Silicon; Silicon compounds; Silicon nanocrystal memories; energy consumption; tunnel oxide thickness;
Conference_Titel :
Semiconductor Conference (CAS), 2012 International
Conference_Location :
Sinaia
Print_ISBN :
978-1-4673-0737-6
DOI :
10.1109/SMICND.2012.6400686