DocumentCode :
2798773
Title :
Transport mechanisms in SiO2 films with embedded Germanium nanoparticles
Author :
Palade, Catalin ; Lepadatu, A. ; Stavarache, Ionel ; Maraloiu, Adrian V. ; Teodorescu, Valentin Serban ; Ciurea, Magdalena Lidia
Author_Institution :
Nat. Inst. of Mater. Phys., Magurele, Romania
Volume :
1
fYear :
2012
fDate :
15-17 Oct. 2012
Firstpage :
91
Lastpage :
94
Abstract :
This paper reports on the conduction mechanisms in amorphous SiO2 films with embedded Ge nanoparticles. For this, measurements of current-temperature and current-voltage were employed and correlated with the microstructure results obtained from transmission electron microscopy (TEM). TEM images reveal that our films contain big Ge nanoparticles with low density and small Ge nanoparticles with high density, the last ones being the only responsible for the electrical transport. Two transport mechanisms were found at low and high temperature respectively, namely hopping on localized states in a band near Fermi level and charge excitation to the extended states at mobility edge.
Keywords :
Fermi level; amorphous semiconductors; carrier mobility; conduction bands; hopping conduction; localised states; nanoparticles; semiconductor thin films; silicon compounds; transmission electron microscopy; Fermi level; SiO2-Ge; TEM; amorphous SiO2 films; charge excitation; conduction mechanisms; current-temperature measurements; current-voltage measurements; electrical transport; embedded Ge nanoparticles; extended states; hopping; localized states; microstructure; mobility edge; transmission electron microscopy; transport mechanisms; Conductivity; Films; Nanocrystals; Temperature; Temperature dependence; Temperature measurement; Conduction mechanisms; Magnetron sputtering; Nanoparticles; TEM;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference (CAS), 2012 International
Conference_Location :
Sinaia
ISSN :
1545-857X
Print_ISBN :
978-1-4673-0737-6
Type :
conf
DOI :
10.1109/SMICND.2012.6400689
Filename :
6400689
Link To Document :
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