DocumentCode :
2799437
Title :
Silicon VLSI technology-today and tomorrow
Author :
Ning, T.H.
Author_Institution :
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
fYear :
1991
fDate :
20-23 Oct. 1991
Firstpage :
15
Lastpage :
18
Abstract :
The status of the leading-edge silicon VLSI products is reviewed. The future development trends of silicon VLSI technology are projected by examining scaling limitations and by exploring opportunities such as stacked TFT, HBT, SOI, and low-temperature system operation.<>
Keywords :
VLSI; elemental semiconductors; integrated circuit technology; silicon; HBT; SOI; Si; VLSI technology; low-temperature system operation; scaling limitations; stacked TFT; BiCMOS integrated circuits; CMOS technology; Integrated circuit interconnections; Logic; Power dissipation; Random access memory; SRAM chips; Silicon; Thin film transistors; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1991. Technical Digest 1991., 13th Annual
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-0196-X
Type :
conf
DOI :
10.1109/GAAS.1991.172622
Filename :
172622
Link To Document :
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