Title :
A 3D micromixer fabricated with dry film resist
Author :
Radadia, Adarsh D. ; Cao, Li ; Jeong, Hae-Kwon ; Shannon, Mark A. ; Masel, Richard I.
Author_Institution :
Univ. of Illinois at Urbana-Champaign, Champaign
Abstract :
This paper presents a novel technique to build 3D microstructures using sequential lamination of dry film resist. Each layer is laminated, exposed, developed and flood exposed successively to form a 3D structure. The dry film resist method proves to be advantageous in terms of time and alignment accuracy. Dry film resist is limited by the resolution achieved via photopatterning. This paper also describes a fabrication process to achieve high resolution features with dry film resist. Processing parameters for achieving minimal sagging of suspended structures are discussed. Efficiency of micro-mixers enhance the ability of lab-on- chip devices. A 3D split-join-split type serial lamination micromixer that has been fabricated to demonstrate the feasibility of the dry film resist based process. This paper also shows feasibility to make woodpile structure with layer-by-layer processing of dry film resist.
Keywords :
laminations; microwave mixers; 3D micromixer fabrication; 3D split-join-split type serial lamination micromixer; dry film resist; layer-by-layer processing; photopatterning; sequential lamination; Aluminum; Fabrication; Lamination; Lithography; Microfluidics; Micromechanical devices; Resists; Sputter etching; Substrates; Temperature;
Conference_Titel :
Micro Electro Mechanical Systems, 2007. MEMS. IEEE 20th International Conference on
Conference_Location :
Hyogo
Print_ISBN :
978-1-4244-095-5
Electronic_ISBN :
1084-6999
DOI :
10.1109/MEMSYS.2007.4433110