DocumentCode
2800297
Title
TCAD process/device modeling challenges and opportunities for the next decade
Author
Giles, M.D.
Author_Institution
Intel Corp., Hillsboro, OR, USA
fYear
2004
fDate
24-27 Oct. 2004
Firstpage
35
Abstract
Technology CAD process and device simulation tools play a critical role in advanced technology development by giving insight into the relationships between processing choices and nanoscale device performance that cannot be obtained from physical metrology tools alone. TCAD makes its greatest impact when a detailed understanding of the underlying physical mechanisms is tightly coupled within the technology development cycle so that physical insights feed directly into technology directions. This paper highlights progress in modeling over the past decade that has enabled this success and the challenges and opportunities that lie ahead.
Keywords
semiconductor device models; technology CAD (electronics); device modeling; device simulation tools; technology CAD process; Semiconductor device modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Computational Electronics, 2004. IWCE-10 2004. Abstracts. 10th International Workshop on
Conference_Location
West Lafayette, IN, USA
Print_ISBN
0-7803-8649-3
Type
conf
DOI
10.1109/IWCE.2004.1407306
Filename
1407306
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