• DocumentCode
    2800297
  • Title

    TCAD process/device modeling challenges and opportunities for the next decade

  • Author

    Giles, M.D.

  • Author_Institution
    Intel Corp., Hillsboro, OR, USA
  • fYear
    2004
  • fDate
    24-27 Oct. 2004
  • Firstpage
    35
  • Abstract
    Technology CAD process and device simulation tools play a critical role in advanced technology development by giving insight into the relationships between processing choices and nanoscale device performance that cannot be obtained from physical metrology tools alone. TCAD makes its greatest impact when a detailed understanding of the underlying physical mechanisms is tightly coupled within the technology development cycle so that physical insights feed directly into technology directions. This paper highlights progress in modeling over the past decade that has enabled this success and the challenges and opportunities that lie ahead.
  • Keywords
    semiconductor device models; technology CAD (electronics); device modeling; device simulation tools; technology CAD process; Semiconductor device modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computational Electronics, 2004. IWCE-10 2004. Abstracts. 10th International Workshop on
  • Conference_Location
    West Lafayette, IN, USA
  • Print_ISBN
    0-7803-8649-3
  • Type

    conf

  • DOI
    10.1109/IWCE.2004.1407306
  • Filename
    1407306