Title :
Thirty years of Monte Carlo simulations of electronic transport in semiconductors: their relevance to science and to mainstream VLSI technology
Author :
Fischetti, M.V. ; Laux, S.E. ; Solomon, P.M. ; Kumar, A.
Author_Institution :
Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
Abstract :
In the talk, having reviewed a few chapters of the science-related history of MC simulations, we shall delve into this "real world". A prototypical example of these accurate yet flexible physical foundations of MC models is presented: scaled MOSFETs using Si, Ge, InP and In/sub 0.53/Ga/sub 0.47/As are simulated with a complete physical model. While at (relatively) large channel lengths, the small transport mass of III-V compound semiconductors gives them some performance advantage, at the shortest channel length their small density-of-states effective mass makes them "choke" (too few "channels" - a la Landauer - to carry current). Ge appears superior, but only on the chosen (111) surface orientations and ignoring band-to-band leakage issues. Additional examples - especially dealing with strained-Si devices, ballistic transport, and the meaning/relevance of the concept of "mobility" in small devices - are also given.
Keywords :
III-V semiconductors; MOSFET; Monte Carlo methods; VLSI; elemental semiconductors; germanium; indium compounds; semiconductor device models; silicon; transport processes; Ge; III-V compound semiconductors; InGaAs; InP; Monte Carlo simulations; Si; VLSI technology; ballistic transport; band-to-band leakage; channel lengths; electronic transport; scaled MOSFET; strained-Si devices; surface orientations; transport mass; Germanium; Indium compounds; MOSFETs; Monte Carlo methods; Semiconductor device modeling; Silicon; Very-large-scale integration;
Conference_Titel :
Computational Electronics, 2004. IWCE-10 2004. Abstracts. 10th International Workshop on
Conference_Location :
West Lafayette, IN, USA
Print_ISBN :
0-7803-8649-3
DOI :
10.1109/IWCE.2004.1407314