DocumentCode :
2800649
Title :
Highly reliable and extremely stable SiGe micro-mirrors
Author :
Gromova, M. ; Haspeslagh, L. ; Verbist, A. ; Du Bois, B. ; Van Hoof, R. ; Eyckens, B. ; Sijmus, B. ; De Wolf, I. ; Simons, V. ; Mutter, P. ; Lauwagie, T. ; Willegems, M. ; Locorotondo, S. ; Boullart, W. ; Baert, K. ; Witvrouw, A.
Author_Institution :
lMEC, Leuven
fYear :
2007
fDate :
21-25 Jan. 2007
Firstpage :
759
Lastpage :
762
Abstract :
This paper presents very reliable and stable micro- mirrors made of hydrogenated microcrystalline SiGe (muc-SiGe:H) at temperatures that would allow processing above standard CMOS circuitry. Very flat micro-mirrors with sizes ranging between 7.5 x 7.5 and 16 x 16 mum2 size and submicron hinges are fabricated. No hinge creep is observed over a period of 20 days and no fatigue damage is seen after 5 x 1010 cycles.
Keywords :
CMOS integrated circuits; micromirrors; SiGe; SiGe micromirrors; hydrogenated microcrystalline; standard CMOS circuitry; time 20 day; CMOS process; Cleaning; Electrodes; Fasteners; Germanium silicon alloys; Hydrogen; Micromechanical devices; Mirrors; Semiconductor films; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 2007. MEMS. IEEE 20th International Conference on
Conference_Location :
Hyogo
ISSN :
1084-6999
Print_ISBN :
978-1-4244-095-5
Electronic_ISBN :
1084-6999
Type :
conf
DOI :
10.1109/MEMSYS.2007.4433173
Filename :
4433173
Link To Document :
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