• DocumentCode
    2801828
  • Title

    Remote Hasma Deposited Amorphous Silicon with In-Situ Hydrogen Etching

  • Author

    Lo, Yoon F. ; Collis, Ward J.

  • Author_Institution
    Department of Electrical Engineering, North Carolina A&T State University
  • fYear
    1992
  • fDate
    1-3 Mar 1992
  • Firstpage
    64
  • Lastpage
    66
  • Keywords
    Amorphous silicon; Etching; Helium; Hydrogen; Plasma applications; Plasma chemistry; Plasma measurements; Plasma temperature; Radio frequency; Semiconductor thin films;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    System Theory, 1992. Proceedings. SSST/CSA 92. The 24th Southeastern Symposium on and The 3rd Annual Symposium on Communications, Signal Processing Expert Systems, and ASIC VLSI Design
  • ISSN
    0094-2898
  • Print_ISBN
    0-8186-2665-8
  • Type

    conf

  • DOI
    10.1109/SSST.1992.712190
  • Filename
    712190
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2801828