DocumentCode
2802107
Title
A computational intelligent optical proximity correction for process distortion compensation of layout mask in subwavelength era
Author
Shao-Ming Yu ; Yiming Li
Author_Institution
Dept. of Comput. & Inf. Sci., Nat. Chiao Tung Univ., Hsinchu, Taiwan
fYear
2004
fDate
24-27 Oct. 2004
Firstpage
179
Lastpage
180
Abstract
In this work, the authors develop an intelligent OPC approach which combines the genetic algorithm (GA), the rule-based technique, and conventional model-based correction method to perform the mask correction in subwavelength era. Basic idea is that the GA and the lithography simulator is applied to find out the best size and position for a complete layout with those additional patterns which generated by rules.
Keywords
circuit complexity; circuit layout; electronic engineering computing; genetic algorithms; masks; proximity effect (lithography); submillimetre waves; computational intelligent optical proximity correction; conventional model-based correction method; genetic algorithm; layout mask; lithography simulator; mask correction; process distortion compensation; rule-based technique; subwavelength era; Genetic algorithms; Submillimeter wave technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Computational Electronics, 2004. IWCE-10 2004. Abstracts. 10th International Workshop on
Conference_Location
West Lafayette, IN, USA
Print_ISBN
0-7803-8649-3
Type
conf
DOI
10.1109/IWCE.2004.1407385
Filename
1407385
Link To Document