• DocumentCode
    2802603
  • Title

    Extending a 0.35 NA h-Line Stepper to 0.8 Micrometer (1.6 Micrometer Pitch) CMOS Technology Using Halo LDD Devices and Trilayer Templates

  • Author

    Markus, K.W. ; Goodwin-Johansson, S. ; Rogers, W.B. ; Donaldson, W.C.

  • Author_Institution
    MCNC Center for Microelectronics, NC
  • fYear
    1992
  • fDate
    1-3 Mar 1992
  • Firstpage
    67
  • Lastpage
    71
  • Keywords
    CMOS process; CMOS technology; Circuits; Etching; Implants; Lithography; MOS devices; Microelectronics; Resists; Titanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    System Theory, 1992. Proceedings. SSST/CSA 92. The 24th Southeastern Symposium on and The 3rd Annual Symposium on Communications, Signal Processing Expert Systems, and ASIC VLSI Design
  • ISSN
    0094-2898
  • Print_ISBN
    0-8186-2665-8
  • Type

    conf

  • DOI
    10.1109/SSST.1992.712194
  • Filename
    712194
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2802603