DocumentCode :
2802886
Title :
A microscopic quantum simulation of Si/SiO/sub 2/ interface roughness scattering in silicon nanowire transistors
Author :
Jing Wang ; Polizzi, E. ; Ghosh, A. ; Datta, S. ; Lundstrom, M.
Author_Institution :
Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
fYear :
2004
fDate :
24-27 Oct. 2004
Firstpage :
247
Lastpage :
248
Abstract :
The silicon nanowire transistor (SNWT) has attracted broad attention as a promising device structure for future integrated circuits. As a result, the exploration of carrier transport and the modeling of various scattering mechanisms in Si nanowires become increasingly important. In this work, we perform a microscopic, quantum-mechanical simulation of Si/SiO/sub 2/ interface roughness scattering (so called "surface roughness scattering (SRS)") in SNWTs. In brief, this work provides an opportunity to understand the physics of SRS in SNWTs, which can be substantially different from that in planar MOSFETs.
Keywords :
electron-electron scattering; elemental semiconductors; field effect transistors; interface roughness; nanowires; quantum theory; silicon compounds; Si-SiO/sub 2/; carrier transport; device structure; integrated circuits; interface roughness scattering; microscopic quantum simulation; quantum-mechanical simulation; scattering mechanisms; silicon nanowire transistors; surface roughness scattering; FETs; Quantum theory; Silicon compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Computational Electronics, 2004. IWCE-10 2004. Abstracts. 10th International Workshop on
Conference_Location :
West Lafayette, IN, USA
Print_ISBN :
0-7803-8649-3
Type :
conf
DOI :
10.1109/IWCE.2004.1407419
Filename :
1407419
Link To Document :
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