Title :
A high-efficiency, high-frequency boost converter using enhancement mode GaN DHFETs on silicon
Author :
Everts, Jordi ; Das, Jo ; Van den Keybus, Jeroen ; Genoe, Jan ; Germain, Marianne ; Driesen, Johan
Author_Institution :
Dept. of Electr. Eng. ESAT-ELECTA, Kath. Univ. Leuven (K.U.Leuven), Leuven, Belgium
Abstract :
A boost converter was constructed using a high voltage enhancement mode (E-mode) AlGaN/GaN/AlGaN DHFET transistor grown on Si<;111>. The very low dynamic onresistance (Rdyn ≈ 0.23 Ω) and very low gate-charges (e.g. Qgate ~15 nC at Vos = 200 V) result in minor transistor losses. Together with a proper design of the passive components and the use of SiC diodes, very high overall efficiencies are reached. Measurements show high conversion efficiencies of 96.1% (Pout = 106 W, 76 to 142 V at 512.5 kHz) and 93.9% (Pout = 97.5 W, 78 to 142 V at 845.2 kHz). These are, to our knowledge, the highest efficiencies reported for an enhancement mode GaN DHFET on Si in this frequency range. The transistor switching losses are concentrated in the turn-on interval, and dominate at high frequencies. This is due to a limited positive gate-voltage swing, as the gate-source diode restricts the positive drive voltage.
Keywords :
III-V semiconductors; aluminium compounds; elemental semiconductors; field effect transistors; gallium compounds; power convertors; semiconductor diodes; silicon; wide band gap semiconductors; AlGaN-GaN-AlGaN-Si; SiC; boost converter; frequency 512.5 kHz; gate-source diode; high voltage enhancement mode DHFET transistor; minor transistor losses; passive components; positive drive voltage; positive gate-voltage swing; power 106 W; power 845.2 W; power 97.5 W; transistor switching losses; turn-on interval; voltage 200 V; voltage 76 V to 142 V; Converters; Current measurement; DH-HEMTs; Gallium nitride; Inductors; Logic gates; Voltage measurement; GaN DHFET; boost converter; enhancement mode (E-mode); high efficiency; very high frequency; wide bandgap;
Conference_Titel :
Energy Conversion Congress and Exposition (ECCE), 2010 IEEE
Conference_Location :
Atlanta, GA
Print_ISBN :
978-1-4244-5286-6
Electronic_ISBN :
978-1-4244-5287-3
DOI :
10.1109/ECCE.2010.5618323